A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon–tin oxide by atomic layer deposition

Author:

Han Ju-Hwan,Kim Dong-Yeon,Lee Seunghwan,Yang Hae Lin,Park Byung HoORCID,Park Jin-SeongORCID

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials

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