Synthesis of Al2O3@MnO2 composite abrasives and their chemical mechanical polishing performance on silicon carbide (SiC)

Author:

Zhang Peijia,Lei Hong,Zhang Zefang,Zhang Jianhua,Chen Shidong,Hu Xiaogang

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference48 articles.

1. A review of SiC IGBT: models, fabrications, characteristics, and applications;Han;IEEE Trans. Power Electron.,2021

2. Novel abrasive-free planarization of 4H-SiC (0001) using catalyst;Hara;J. Electron. Mater.,2006

3. Synergistic effect of aminosilane and K2CO3 on improving Chemical Mechanical Polishing performance of SiO2 dielectric layer;Zhao;Mater. Sci. Semicond. Process.,2022

4. Recent advances in silicon carbide chemical mechanical polishing technologies;Hsieh;Micro,2022

5. Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials;Aida;Curr. Appl. Phys.,2012

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