Glow discharge deposition of chlorinated and hydrogenated amorphous silicon films from SiCl4SiH4
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference15 articles.
1. Amorphous Semiconductors;Carlson,1979
2. Quantitative analysis of hydrogen in glow discharge amorphous silicon
3. Photoluminescence of hydrogenated amorphous silicon
4. A new amorphous silicon-based alloy for electronic applications
5. Temperature Measurements of Rarefied Gases by the Metastable Time-of-Flight Technique
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1. Plasma polymerization of C4Cl6 and C2H2Cl4 at atmospheric pressure;Polymer;2013-07
2. X-ray photoelectron spectroscopy study of post-hydrogenated homogeneous chemically vapour-deposited amorphous silicon films;Philosophical Magazine A;1997-02
3. rf glow discharge of SiF4‐H2mixtures: Diagnostics and modeling of thea‐Si plasma deposition process;Journal of Applied Physics;1991-05-15
4. Photovoltaic characterization of amorphous hydrogenated and chlorinated silicon films;Thin Solid Films;1989-03
5. Dependence of glow discharge Si:H:Cl film morphology on diluent gas and SiCl4 partial pressure;Applied Physics A Solids and Surfaces;1988-11
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