Photovoltaic properties of amorphous silicon produced by reactive sputtering-Reference-Cited by-同舟云学术

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Photovoltaic properties of amorphous silicon produced by reactive sputtering

Published:1986-06 Issue:5 Volume:13 Page:373-384
ISSN:0165-1633
Container-title:Solar Energy Materials
language:en
Short-container-title:Solar Energy Materials

Author:

Moustakas T.D.

Publisher

Elsevier BV

Subject

General Engineering

Reference20 articles.

1. Properties and photovoltaic applications of microcrystalline silicon films prepared by rf reactive sputtering

2. Tetrahedrally Bonded Amorphous Semiconductors;Moustakas,1985

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication Processes for Electrical and Electro-Optical Thin Films;Introduction to Surface Engineering and Functionally Engineered Materials;2011-09-30

2. Three-Terminal Amorphous Silicon Solar Cells;International Journal of Photoenergy;2011

3. Intrinsic, n- and p-Doped a-Si:H Thin Films Grown by DC Magnetron Sputtering with Doped Targets;MRS Proceedings;1999

4. Boron Doped A-Si,C:H Grown by Reactive Magnetron Sputtering from Doped Targets;MRS Proceedings;1994

5. Monte Carlo simulation of the transport process in the growth ofa‐Si:H prepared by cathodic reactive sputtering;Journal of Applied Physics;1990-01

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