Corrosion behavior of hafnium in anhydrous isopropanol and acetonitrile solutions containing bromide ions-Reference-Cited by-同舟云学术

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Corrosion behavior of hafnium in anhydrous isopropanol and acetonitrile solutions containing bromide ions

Published:2017-08 Issue:8 Volume:27 Page:1896-1906
ISSN:1003-6326
Container-title:Transactions of Nonferrous Metals Society of China
language:en
Short-container-title:Transactions of Nonferrous Metals Society of China

Author:

WANG Chang-hong,YANG Sheng-hai,YUAN Yi,CHEN Yong-ming,WANG Biao,HE Jing,TANG Chao-bo

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Geotechnical Engineering and Engineering Geology,Condensed Matter Physics

Reference37 articles.

1. Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films [J];SZYMANSKAZ;Applied Surface Science,2014

2. Silicon device scaling to the sub-10-nm regime [J];IEONG;Science,2004

3. Hafnium oxide thin films: Effect of growth parameters on oxygen and hafnium vacancies [J];HILDEBRANDT;Journal of Vacuum Science & Technology B,2009

4. Study of the effect of thermal annealing on high k, hafnium oxide thin film structure and electrical properties of MOS and MIM devices [J];SRIVASTAVA;Journal of Materials Science Materials in Electronics,2011

5. Development of hafnium based high-k materials—A review [J];CHOI;Materials Sciences & Engineering Reports,2011

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