Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
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4. On the scaling issues and high-k replacement of ultrathin gate dielectrics for nanoscale MOS transistors;Wong;Microelectron. Eng.,2006
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