Development of a New Mechanochemical Polishing Method with a Polishing Film for Ceramic Round Bars-Reference-Cited by-同舟云学术

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Development of a New Mechanochemical Polishing Method with a Polishing Film for Ceramic Round Bars

Published:1992 Issue:1 Volume:41 Page:339-342
ISSN:0007-8506
Container-title:CIRP Annals
language:en
Short-container-title:CIRP Annals

Author:

Suzuki K.,Uematsu T.,Ohashi H.,Kitajima K.,Suga T.,Imanaka O.,Kobayashi A.

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

Reference3 articles.

1. Highly Efficient Grinding of Ceramics and Hard Metals on Grinding Center;Nakagawa;Annals of the CIRP,1986

2. Mechanochemical Polishing of Sintered Silicon Nitride;Suga;J. of JSPE,1989

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1. Study on the finishing capability and abrasives-sapphire interaction in dry chemo-mechanical-grinding (CMG) process;Precision Engineering;2018-04

2. Study on the potential of chemo-mechanical-grinding (CMG) process of sapphire wafer;The International Journal of Advanced Manufacturing Technology;2016-12-13

3. AN ENERGY ANALYSIS OF BELT POLISHING PROCESS AND ITS APPLICATIONS TO TIME CYCLE AND TRACKING EFFECTS;Machining Science and Technology;2007-05-29

4. A comparative study between smaller-the-better and normal-the-best quality characteristics when lapping ceramic blocks;The International Journal of Advanced Manufacturing Technology;2006-04-19

5. An analytical model of the material removal rate between elastic and elastic-plastic deformation for a polishing process;The International Journal of Advanced Manufacturing Technology;2006-03-30

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