Electrical resistivity of titanium nitride thin films prepared by ion beam-assisted deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Electrical resistivity of titanium nitride thin films prepared by ion beam-assisted deposition

Published:2001-12 Issue:1-4 Volume:307 Page:150-157
ISSN:0921-4526
Container-title:Physica B: Condensed Matter
language:en
Short-container-title:Physica B: Condensed Matter

Author:

Lal K.,Meikap A.K.,Chattopadhyay S.K.,Chatterjee S.K.,Ghosh M.,Baba K.,Hatada R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference37 articles.

1. A study of defects in sputtered TiN coatings by electrochemical polarization

2. A comparative study of the corrosion performance of TiN, Ti(B,N) and (Ti,Al)N coatings produced by physical vapour deposition methods

3. X-ray analysis of heat-treated titanium nitride films

4. Establishing the relationship between process, structure, and properties of TiN films deposited by electron cyclotron resonance assisted reactive sputtering. I. Variations in hardness and roughness as a function of process parameters

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Quasiclassical Anderson transition and thermally activated percolative charge transport in single-crystalline ScN;Physical Review B;2024-04-25

2. Microstructural and Electrical Resistivity of TiN Electrode Films Prepared by Direct Current (DC) Reactive Magnetron Sputtering;Science of Advanced Materials;2023-10-01

3. Influence of mechanical properties of coating and substrate on wear performance of HDLC and TiN-coated AISI 5140 alloy steel;Proceedings of the Institution of Mechanical Engineers, Part E: Journal of Process Mechanical Engineering;2022-11-17

4. Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structures;Applied Sciences;2022-10-15

5. Controllable Optical Characteristics of TiN Films Prepared by Magnetron Sputtering;Lecture Notes in Electrical Engineering;2021

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3