Controllable Optical Characteristics of TiN Films Prepared by Magnetron Sputtering
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Publisher
Springer Singapore
Link
http://link.springer.com/content/pdf/10.1007/978-981-33-4110-4_16
Reference13 articles.
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3. Didden A, Battjes H, Machunze R, Dam B, van de Krol R (2011) Titanium nitride: a new Ohmic contact material for n-type CdS. J Appl Phys 110(3):033717
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5. Kinsey N, Ferrera M, Naik GV, Babicheva VE, Shalaev VM, Boltasseva A (2014) Experimental demonstration of titanium nitride plasmonic interconnects. Opt Express 22(10):12238–12247
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