Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference9 articles.
1. Rübig GmbH, Wels, Austria, www.rubig.com.
2. Titanium nitride deposited by plasma-assisted chemical vapour deposition
3. Flow visualization studies for optimization of the growth of TiN by PACVD
4. The time development of pulsed-DC production plasmas used for deposition of TiN
5. Study of a Pulsed DC Glow-Discharge Used for Plasma-CVD with an Ultrafast Videosystem and a Langmuir-Probe
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