Influence of nitrogen content on the thermal diffusivity of TiN films prepared by magnetron sputtering-Reference-Cited by-同舟云学术

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Influence of nitrogen content on the thermal diffusivity of TiN films prepared by magnetron sputtering

Published:2019-11-25 Issue:2 Volume:36 Page:192-198
ISSN:0267-0844
Container-title:Surface Engineering
language:en
Short-container-title:Surface Engineering

Author:

Lu Guiyun¹,Yu Lihua¹,Ju Hongbo¹,Zuo Bin¹,Xu Junhua¹

Affiliation:

1. School of Materials Science and Engineering, Jiangsu University of Science and Technology, Zhenjiang, People's Republic of China

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.tandfonline.com/doi/pdf/10.1080/02670844.2019.1646964

Reference31 articles.

1. Microstructure, mechanical and tribological properties of TaCN composite films

2. Microstructure, mechanical and tribological properties of TiN-Ag films deposited by reactive magnetron sputtering

3. Physical and morphological characterization of reactively magnetron sputtered TiN films

4. Microstructure, oxidation resistance, mechanical and tribological properties of Ti–Y–N films by reactive magnetron sputtering

5. The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films

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1. First-principles calculations on adsorption-diffusion behavior of transition layer Ti atoms on the Fe surface;Journal of Vacuum Science & Technology A;2024-08-16

2. Thickness uniformity, electrical properties, and stress of sputtered TiN thin films;Journal of Physics: Conference Series;2024-08-01

3. Structural, mechanical, and anticorrosive properties of (TiZrNbTa)N films;Journal of Materials Research and Technology;2023-09

4. DPF-produced TiN coatings on NiTi: biological and mechanical properties;Journal of Adhesion Science and Technology;2023-05-08

5. Study of the Optoelectronic Properties of Titanium Nitride Thin Films Deposited on Glass by Reactive Sputtering in the Cathodic Cage;Materials Research;2023

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