Remote-coupled sensing of plasma harmonics and process end-point detection
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference23 articles.
1. Virtual plasma equipment model: a tool for investigating feedback control in plasma processing equipment
2. Production data based optimal etch time control design for a reactive ion etching process
3. End‐point determination of aluminum reactive ion etching by discharge impedance monitoring
4. End-point determination by reflected power monitoring
5. Measurement and analysis of radio frequency glow discharge electrical impedance and network power loss
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3. Novel Methodology for Characterizing Non-Linear Harmonics in Radio Frequency Discharges;2020 IEEE International Conference on Plasma Science (ICOPS);2020-12-06
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