Radical measurements in plasma processing
Author:
Publisher
Elsevier
Reference39 articles.
1. Mechanisms of etching and polymerization in radiofrequency discharges of CF4-H2, CF4-C2F4, CF6-H2, C3F8-H2;d'Agnostino;J. Appl. Phys.,1983
2. Infrared diode laser diagnottics of methane plasmas produced in a deposition reactor;Davies;Appl. Phys. Lett.,1990
3. Recent advances in radical measurements on plasmas used for semiconductor processing;Goto;OYO BUTURI,1993
4. Radical behavior in flurocarbon plasma and control of silicon oxide etching by injection of radicals;Goto;Jpn. J. Appl. Phys.,1996
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Radical-controlled plasma processes;Reviews of Modern Plasma Physics;2022-11-10
2. Metastables as a probe for low-temperature plasma characteristics in argon;Journal of Physics D: Applied Physics;2019-03-14
3. Electron attachment to fluorocarbon radicals;The Journal of Chemical Physics;2012-12-07
4. Teaching an Old Dog New Tricks: Using the Flowing Afterglow to Measure Kinetics of Electron Attachment to Radicals, Ion–Ion Mutual Neutralization, and Electron Catalyzed Mutual Neutralization;Advances In Atomic, Molecular, and Optical Physics;2012
5. Radical-controlled plasma processing for nanofabrication;Journal of Physics D: Applied Physics;2011-04-14
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3