Deep X-ray lithography for the fabrication of microstructures at ELSA
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference4 articles.
1. Influence of developer temperature and resist material on the structure quality in deep x-ray lithography
2. Adhesion problems in deep-etch x-ray lithography caused by fluorescence radiation from the plating base
3. Influence of secondary effects on the structure quality in deep X-ray lithography
4. Preliminary results on the use of mirrors for LIGA process
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1. Optimization of line edge roughness before and after etching with photoresist in soft x-ray interference lithography;International Conference on Optoelectronic and Microelectronic Technology and Application;2020-12-04
2. High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layers Using Deep X-ray Lithography at SyLMAND;Synchrotron Radiation News;2019-07-04
3. SyLMAND: a microfabrication beamline with wide spectral and beam power tuning range at the Canadian Light Source;Journal of Synchrotron Radiation;2019-02-12
4. On aberrations in saw-tooth refractive X-ray lenses and on their removal;Journal of Synchrotron Radiation;2011-01-20
5. Investigation of the radiation-induced thermal flexure of an x-ray lithography mask during a tilted exposure;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-01
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