Focused ion beam technology for optoelectronics-Reference-Cited by-同舟云学术

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Focused ion beam technology for optoelectronics

Published:1991-07 Issue:1-3 Volume:9 Page:307-314
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Gamo Kenji

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference43 articles.

1. A variable energy focused ion beam system for in situ microfabrication

2. A 0–30 keV low-energy focused ion beam system

3. H. Sawaragi, W. Thompson and M. Hassel Shearer, Proc. 2nd U.S.-Japan Seminar on Focused Ion Beams and Applications, in J. Vac. Sci. Technol., in the press.

4. Dot lithography for zero-dimensional quantum wells using focused ion beams

5. 30 nm Line Fabrication on PMMA Resist by Fine Focused Be Ion Beam

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Waveguide Fabrication Techniques;Integrated Optics;2009

2. Waveguide Fabrication Techniques;Advanced Texts in Physics;2002

3. Waveguide Fabrication Techniques;Integrated Optics;1995

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