Author:
Shiokawa Takao,Aoyagi Yoshinobu,Kim Pil Hyon,Toyoda Koichi,Namba Susumu
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
25 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dry-etching development characteristics of Se[sub 75]Ge[sub 25] resist for focused-ion-beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-07
2. Nanofabrication for Electronics;Advances in Imaging and Electron Physics;1997
3. Nanofabrication Using Focused Ion Beams;Laser and Ion Beam Modification of Materials;1994
4. Modelling of physical processes in ion lithography;Thin Solid Films;1992-07
5. The Physics of Ion-Beam Lithography;The Physics of Submicron Lithography;1992