Low energy, oxygen dose optimization for thin film separation by implanted oxygen-Reference-Cited by-同舟云学术

Low energy, oxygen dose optimization for thin film separation by implanted oxygen

Published:1992-01 Issue:1-2 Volume:12 Page:41-45
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Robinson A.K.,Li Y.,Marsh C.D.,Chater R.J.,Hemment P.L.F.,Kilner J.A.,Booker G.R.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference16 articles.

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3. High quality Si‐on‐SiO2films by large dose oxygen implantation and lamp annealing

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