Effect of implantation energy on the microstructure evolution of low dose separation of implanted oxygen wafers-Reference-Cited by-同舟云学术

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Effect of implantation energy on the microstructure evolution of low dose separation of implanted oxygen wafers

Published:2001 Issue:2 Volume:19 Page:337
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Chen M.,Chen J.,Zheng W.,Li L.,Mu H. C.,Lin Z. X.,Yu Y. H.,Wang X.,Wang G. Y.

Publisher

American Vacuum Society

Subject

General Engineering

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