Improvement of gate CD imbalance for a 0.35μm logic technology
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference11 articles.
1. Mechanism for anisotropic etching of phoresist-masked polycrystalline silicon in HBr plasmas;Cheng;J Vac Sci Technol B,1996
2. Orshansky M, Milor L, Nguyen L, Hill G, Peng Y, Hu C. Intra-field gate CD variability and its impact on circuit performance. IEDM Tech Dig 1999; 479.
3. Simulating the impact of pattern-dependent poly CD variation on circuit performance;Stine;IEEE Trans Semicond Manuf,1998
4. Study of the impact of the time-delay effect on the critical dimension of a tungsten silicide/polysilicon gate after reactive ion etching;Lin;J Vac Sci Technol A,2000
5. Thakar G, McNeil V, Madan S, Riemenschneider B, Rogers D, McKee J, Eklund R, Chapman R. A manufacturable high performance quarter micron CMOS technology using I-line lithography and gate linewidth reduction etch process. Proceeding of the Symposium on VLSI Technology, 1996. p. 216.
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3