Author:
Lin Shih-Po,Ou Chen-Hsien,Lee Szetsen,Tien Yu-Chung,Hsu Chin-Fa
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
7 articles.
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1. DNA Origami for Silicon Patterning;ACS Applied Materials & Interfaces;2020-07-17
2. Plasma Stripping, Cleaning, and Surface Conditioning;Handbook of Silicon Wafer Cleaning Technology;2018
3. Asymmetrical formation of etching residues and their roles in inner-gate-recessed-channel-array-transistor;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-03
4. Optical diagnostics of plasma chemistries and chamber conditions in gate oxide stack etch;Materials Science in Semiconductor Processing;2013-04
5. Plasma Stripping, Cleaning, and Surface Conditioning;Handbook of Silicon Wafer Cleaning Technology;2008