Simulating the impact of pattern-dependent poly-CD variation on circuit performance-Reference-Cited by-同舟云学术

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Simulating the impact of pattern-dependent poly-CD variation on circuit performance

Published:1998 Issue:4 Volume:11 Page:552-556
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Stine B.E.,Boning D.S.,Chung J.E.,Ciplickas D.J.,Kibarian J.K.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx4/66/15704/00728551.pdf?arnumber=728551

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of Regularity-Enhanced Layout on Variability and Circuit Performance of Standard Cells;IPSJ Transactions on System LSI Design Methodology;2010

2. Layout optimization based on a generalized process variability model;SPIE Proceedings;2008-03-14

3. Leakage Minimization of Digital Circuits Using Gate Sizing in the Presence of Process Variations;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2008-03

4. Line edge roughness impact on critical dimension variation;SPIE Proceedings;2007-03-16

5. Pattern matching, simulation, and metrology of complex layouts fabricated by electron beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007

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