Ni and Ti silicide oxidation for CMOS applications investigated by XRD, XPS and FPP
Author:
Funder
CEA-Leti, Minatec
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference21 articles.
1. Kinetics study of NiPt(10at%)/Si0.7Ge0.3 solid state reactions;Bourjot;Microelectron. Eng.,2014
2. Advanced model and analysis of series resistance for CMOS scaling into nanometer regime. II. Quantative analysis;Kim;IEEE Trans. Electron Devices,2002
3. Salicidation process using NiSi and its device application;Deng;J. Appl. Phys.,1997
4. NiSi salicide technology for scaled CMOS;Iwai;Microelectron. Eng.,2002
5. Self-aligned nickel-mono-silicide technology for high-speed deep submicrometer logic CMOS ULSI;Morimoto;IEEE Trans.,Electron Devices,1995
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