A novel optical lithography implement utilizing third harmonic generation via metallic tip enhanced near field-Reference-Cited by-同舟云学术

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A novel optical lithography implement utilizing third harmonic generation via metallic tip enhanced near field

Published:2017-01 Issue: Volume:383 Page:418-422
ISSN:0030-4018
Container-title:Optics Communications
language:en
Short-container-title:Optics Communications

Author:

Zhang Hui,Zhu Ning,Mei Ting,He Miao,Li Hao,Chen Zhenshi

Funder

Natural Science Foundation of China

Science and Technology Planning Projects of Guangdong Province, China

Research Fund for the Doctoral Program of Higher Education of China

Guangzhou Science and Technology Project of Guangdong Province, China

Zhongshan Science and Technology Project of Guangdong Province, China

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Resolution limits of optical lithography;Okazaki;J. Vac. Sci. Technol. B,1991

2. 157 nm: deepest deep-ultraviolet yet;Rothschild;J. Vac. Sci. Technol. B,1999

3. Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography;Dumon;IEEE Photon. Technol. Lett.,2004

4. Extreme ultraviolet lithography;Stulen;IEEE J. Quantum Electron.,1999

5. Process conditions in X-ray lithography for the fabrication of devices with sub-micron feature sizes;Mappes;Microsyst. Technol.,2007

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1. Plasmonic Lithography: Recent Progress;Advanced Optical Materials;2019-05-02

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