A beam homogenizer for digital micromirror device lithography system based on random freeform microlenses-Reference-Cited by-同舟云学术

A beam homogenizer for digital micromirror device lithography system based on random freeform microlenses

Published:2019-07 Issue: Volume:443 Page:211-215
ISSN:0030-4018
Container-title:Optics Communications
language:en
Short-container-title:Optics Communications

Author:

Liu Zhongyuan,Liu Hua,Lu Zifeng,Li Qiankun,Li Jinhuan

Funder

National Natural Science Foundation of China

Projects of Science and Technology Development Plan of Jilin Province

State Key Laboratory of Applied Optics

the Lab of Space Optoelectronic Measurement.& Perception

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference21 articles.

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5. Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique;H.Chen;Opt. Express.,2017

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