Total reflection X-ray photoelectron spectroscopy as a semiconductor lubricant elemental analysis method-Reference-Cited by-同舟云学术

Total reflection X-ray photoelectron spectroscopy as a semiconductor lubricant elemental analysis method

Published:2015-12 Issue: Volume:114 Page:34-37
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Alshehabi Abbas,Sasaki Nobuharu,Kawai Jun

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference24 articles.

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2. Hard disk top- layer lubricant chemical state analysis by total reflection x-ray photoelectron spectroscopy (TRXPS), Adv. X-Ray.;Alshehabi;Chem. Anal. Jpn.,2012

3. Angular-dependent X-ray photoemission study of oxidized silicon at low X-ray incidence angles;Mehta;Chem. Phys. Lett.,1977

4. Grazing-incidence X-ray photoelectron spectroscopy from multilayer media: oxidized GaAs(100) as a case study;Chester;Phys. Rev. B,1993

5. Ultrasoft-X-ray reflection, refraction, and production of photoelectrons (100–1000-eV region);Henke;Phys. Rev.,1972

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