High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

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High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy

Published:2021-12 Issue:6 Volume:39 Page:060802
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Rault Julien E.¹^ORCID,Kuo Cheng-Tai²^ORCID,Martins Henrique P.³⁴,Conti Giuseppina³⁴,Nemšák Slavomír⁴^ORCID

Affiliation:

1. Synchrotron SOLEIL, L'Orme des Merisiers, Saint-Aubin-BP48, 91192 Gif-sur-Yvette, France

2. Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, Menlo Park, California 94025

3. Department of Physics, University of California Davis, Davis, California 95616

4. Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720

Funder

Lawrence Berkeley National Laboratory

SLAC National Accelerator Laboratory

Laboratoire d'excellence Physique Atomes Lumière Matière

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/am-pdf/10.1116/6.0001289

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hard X-ray photoelectron spectroscopy and X-ray diffraction techniques: non-destructive compositional, electronic, chemical and structural in-depth characterization in the tens-of-nanometer scale;Non-Destructive Material Characterization Methods;2024

2. X-ray standing-wave spectroscopy: A powerful method for probing buried interfaces;Encyclopedia of Solid-Liquid Interfaces;2024

3. Effect of Domain Structure and Dielectric Interlayer on Switching Speed of Ferroelectric Hf0.5Zr0.5O2 Film;Nanomaterials;2023-12-01

4. Chemical state analysis of reactively sputtered zinc vanadium nitride: The Auger parameter as a tool in materials design;Applied Surface Science;2022-11

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