Superimposed pulse bias voltage used in arc and sputter technology
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Low-energy ion irradiation during film growth for reducing defect densities in epitaxial TiN(100) films deposited by reactive-magnetron sputtering;Hultman;J. Appl. Phys.,1987
2. Ion-surface interactions during film deposition;Takagi;J. Vac. Sci. Technol. A,1984
3. The preparation of thin films by physical vapour deposition methods;Reichelt;Thin Solid Films,1990
4. Activated reactive ion plating (ARIP);Moll;Surf. Coat. Technol.,1989
5. Microstructure modification of TiN by ion bombardment during reactive sputter deposition;Petrov;Thin Solid Films,1989
Cited by 30 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Tuning the Microstructure and Thickness of Ceramic Layers with Advanced Coating Technologies Using Zirconia as an Example;Advanced Engineering Materials;2020-10-15
2. Effects of Pulse Bias Duty Cycle on Composition, Structure and Hardness of Ti–Cu–N Nanocomposite Films Deposited by Pulse Biased Arc Ion Plating;MATERIALS TRANSACTIONS;2015
3. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS);Surface and Coatings Technology;2014-10
4. Deposition and characterization of Ti–Cx–Ny nanocomposite films by pulsed bias arc ion plating;Vacuum;2014-08
5. Comparison of structure and tribological properties of MoS2-Ti films deposited by biased-dc and pulsed-dc;Progress in Organic Coatings;2012-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3