Low‐energy ion irradiation during film growth for reducing defect densities in epitaxial TiN(100) films deposited by reactive‐magnetron sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.338257
Reference13 articles.
1. Ion–surface interactions during vapor phase crystal growth by sputtering, MBE, and plasma‐enhanced CVD: Applications to semiconductors
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3. Nucleation, growth and transformation of amorphous and crystalline solids condensing from the gas phase
4. Effect of ion bombardment on the initial stages of thin film growth
5. Modification of the optical and structural properties of dielectric ZrO2films by ion‐assisted deposition
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