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Interaction between the plasma and the workpiece surface in the process of plasma source ion implantation

  • Published:1994-08 Issue:1-3 Volume:66 Page:525-528
  • ISSN:0257-8972
  • Container-title:Surface and Coatings Technology
  • language:en
  • Short-container-title:Surface and Coatings Technology

Author:

Wang H.S.,Cheng K.Q.,Li J.Q.,Geng M.,Zheng X.C.,Xing D.Z.,Shang Z.K.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Uniform deposition of diamond-like carbon films on polymeric materials for biomedical applications;Surface and Coatings Technology;2004-06

2. Modelling and experiment of plasma-based ion-implanted two-dimensional target;Modelling and Simulation in Materials Science and Engineering;2004-01-07

3. Effect of pulse waveform on plasma sheath expansion in plasma-based ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-10

4. Simulation of a diamond-shaped target with different sizes in plasma based ion implantation;Journal of Physics D: Applied Physics;2000-09-29
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