Strain controlled growth of crack-free GaN with low defect density on silicon (111) substrate
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference19 articles.
1. The origin of stress reduction by low-temperature AlN interlayers;Bläsing;Applied Physics Letters,2002
2. Thermal stability of GaN on (111) Si substrate;Ishikawa;Journal of Crystal Growth,1998
3. GaN on Si substrate with AlGaN/AlN intermediate layer;Ishikawa;Japanese Journal of Applied Physics,1999
4. High-quality GaN on Si substrate using AlGaN/AlN intermediate layer;Ishikawa;Physica Status Solidi (a),1999
5. Influence of the thickness of the 1st GaN layer under a low-temperature AlN interlayer on the properties of GaN layer grown on Si (111);Kim;Journal of Crystal Growth,2010
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4. Growth behavior of hexagonal GaN on Si(100) and Si(111) substrates prepared by pulsed laser deposition;Japanese Journal of Applied Physics;2016-08-02
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