Influence of growth interruption and Si doping on the structural and optical properties of AlxGaN/AlN (x>0.5) multiple quantum wells
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference11 articles.
1. III–Nitride UV Devices
2. Growth of Crack-Free and High-Quality AlGaN with High Al Content Using Epitaxial AlN (0001) Films on Sapphire
3. Effect of growth interruption and the introduction of H[sub 2] on the growth of InGaN/GaN multiple quantum wells
4. Photoluminescence study of Si-doped GaN∕Al0.07Ga0.93N multiple quantum wells with different dopant position
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1. Impacts of Si-doping on vacancy complex formation and their influences on deep ultraviolet luminescence dynamics in Al x Ga1-x N films and multiple quantum wells grown by metalorganic vapor phase epitaxy;Japanese Journal of Applied Physics;2021-12-28
2. Extremely high internal quantum efficiency of AlGaN-based quantum wells on face-to-face annealed sputter-deposited AlN templates;Applied Physics Express;2021-11-22
3. Spatio-time-resolved cathodoluminescence studies of wide-bandgap group-III nitride semiconductors;Japanese Journal of Applied Physics;2020-01-16
4. Influence of Silicon-Doping in n-AlGaN Layer on the Optical and Electrical Performance of Deep Ultraviolet Light-Emitting Diodes;Russian Journal of Physical Chemistry A;2019-12
5. Impact of face-to-face annealed sputtered AlN on the optical properties of AlGaN multiple quantum wells;AIP Advances;2019-12-01
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