Uniform hot-wall MOCVD epitaxial growth of 2inch AlGaN/GaN HEMT structures
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference10 articles.
1. Fabrication and performance of GaN electronic devices
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4. Reducing stress in silicon carbide epitaxial layers
5. Investigation of the temperature profile in a hot-wall SiC chemical vapor deposition reactor
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