Full-wafer mapping and response surface modeling techniques for thin film deposition processes

Author:

León María del Pilar,Adomaitis Raymond A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference16 articles.

1. Intentionally patterned and spatially non-uniform film profiles in chemical vapor deposition processes;Adomaitis;Surf. Coat. Technol.,2007

2. Objects for MWR;Adomaitis;Comput. Chem. Eng.,2002

3. G.E.P. Box, N.R. Draper, Empirical Model-Building and Response Surfaces, Wiley Series in Probability and Mathematical Statistics, Wiley, New York, 1987.

4. Multiplexed mass spectrometric sensing in a spatially programmable chemical vapor deposition system;Cai;J. Vac. Sci. Technol. B,2007

5. Simulation-based design and experimental evaluation of a spatially controllable chemical vapor deposition reactor;Choo;AIChE J.,2005

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