Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor-Reference-Cited by-同舟云学术

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Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor

Published:2007 Issue:4 Volume:25 Page:1288
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Cai Yuhong,Henn-Lecordier Laurent,Rubloff Gary W.,Sreenivasan Ramaswamy,Choo Jae-Ouk,Adomaitis Raymond A.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide;ACS Combinatorial Science;2015-06-10

2. Applications of high throughput (combinatorial) methodologies to electronic, magnetic, optical, and energy-related materials;Journal of Applied Physics;2013-06-21

3. Full-wafer mapping and response surface modeling techniques for thin film deposition processes;Journal of Crystal Growth;2009-06

4. Current literature in mass spectrometry;Journal of Mass Spectrometry;2008-04

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