Tellurium n-type doping of highly mismatched amorphous GaN1−As alloys in plasma-assisted molecular beam epitaxy

Author:

Novikov S.V.,Ting M.,Yu K.M.,Sarney W.L.,Martin R.W.,Svensson S.P.,Walukiewicz W.,Foxon C.T.

Funder

EPSRC UK

US Army Foreign Technology Assessment Support

Director, Office of Science

Office of Basic Energy Sciences

Materials Sciences and Engineering Division, of the U.S. Department of Energy

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference15 articles.

1. Valence band hybridization inN-richGaN1−xAsxalloys

2. W. Walukiewicz, K. Alberi, J. Wu, W. Shan, K.M. Yu, J.W. Ager III, in: Physics of Dilute III–V Nitride Semiconductors and Material Systems: Physics and Technology, (Eds.) Ayse Erol (Springer-Verlag Berlin-Heidelberg 2008) Chapter 3.

3. Visible-light absorption and large band-gap bowing of GaN1−xSbxfrom first principles

4. The growth and properties of GaN:As layers prepared by plasma-assisted molecular beam epitaxy

5. S.V. Novikov, K.M. Yu, W.L. Sarney, Z. Liliental-Weber, M. Ting, R.E.L. Powell, M. Shaw, A.J. Kent, R.W. Martin, S.P. Svensson, W. Walukiewicz, C.T. Foxon, in: Proc.: 2013 Materials Research Society Fall Meeting, Boston, USA, December 1–6, 2013, 253.

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