Multiphoton ionization detection of SiF radicals in SiF4 plasmas
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference34 articles.
1. LIF and OES detection of radical species in SiF4 + H2 plasmas
2. Structure and chemical composition of fluorinated SiO2 films deposited using SiF4/O2 plasmas
3. Electrical and optical properties of amorphous Si:F:H alloys
4. The analyses of an SiF4 plasma in an R.F. glow discharge for preparing fluorinated amorphous silicon thin films
5. rf glow discharge of SiF4‐H2mixtures: Diagnostics and modeling of thea‐Si plasma deposition process
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1. The Thermal Dissociation–Recombination Reactions of SiF4, SiF3, and SiF2: A Shock Wave and Theoretical Modeling Study;The Journal of Physical Chemistry A;2022-11-18
2. Molecular dynamics simulations of CF3 etching of SiC;Thin Solid Films;2008-02
3. Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation;Journal of Non-Crystalline Solids;2007-11
4. Atomic simulation of SiC etching by energetic SiF3;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-07
5. Molecular dynamics simulation of deposition and etching of Si bombarding by energetic SiF;Applied Surface Science;2007-04
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