Molecular dynamics simulation of deposition and etching of Si bombarding by energetic SiF
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference35 articles.
1. Laser-induced fluorescence of the HSiF radical
2. Optical Properties of Fluorinated Silicon Oxide and Organic Spin-on-Glass Films for Thin-Film Optical Waveguides
3. Plasma deposition of amorphous silicon alloys from fluorinated gases
4. Multiphoton ionization detection of SiF radicals in SiF4 plasmas
5. Electrical and optical properties of amorphous Si:F:H alloys
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1. Ab-initio study of SiF2 molecule adsorption on Si(001)-p(2 × 2) reconstructed surface;Solid State Communications;2023-08
2. Modification of silicon nitride with oligo(ethylene glycol)-terminated organophosphonate monolayers;Surface Science;2020-07
3. Density functional theory study of the SiF molecule adsorption and decomposition on p(2×2) reconstructed Si(001) surface;Surface Science;2020-07
4. Fluorine–Silicon Surface Reactions during Cryogenic and Near Room Temperature Etching;The Journal of Physical Chemistry C;2014-12-10
5. Angular Effects on F+Etching SiC: MD Study;Plasma Science and Technology;2012-12
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