Tribological characteristics of Ti-Si-N films deposited by unbalanced DC magnetron sputtering-Reference-Cited by-同舟云学术

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Tribological characteristics of Ti-Si-N films deposited by unbalanced DC magnetron sputtering

Published:2003 Issue: Volume: Page:673-687
ISSN:0167-8922
Container-title:Tribology Series
language:
Short-container-title:

Author:

Tung Simon C.,Jiang Ning,Shen Y.G.,Li L.,Mai Y-W,Chan Tai

Publisher

Elsevier

Reference26 articles.

1. Oxidation kinetics of TiN thin films;Wittner;J. Appl. Phys.,1981

2. Superhard nanocrystalline composite metarials: The TiN/Si3N4 system;Veprek;Appl. Phys. Lett.,1995

3. Reactively sputtered Ti-Si-N films I. Physical properties;Sun;J. Appl. Phys.,1997

4. Preparation and some properties of chemically vapour-deposited Si3N4-TiN composite;Hirai;J. Mater. Sci.,1982

5. Ti-Si-N films prepared by plasma-enhanced chemical vapor deposition;Li;Plasma Chem. Plasma Process.,1992

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