Capacitively coupled radio frequency nitrogen plasma etch damage to N-type gallium nitride-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Capacitively coupled radio frequency nitrogen plasma etch damage to N-type gallium nitride

Published:2013-01 Issue: Volume:87 Page:136-140
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Kawakami Retsuo,Takeichi Atsushi,Niibe Masahito,Konishi Masashi,Mori Yuta,Kotaka Takuya,Inaoka Takeshi,Tominaga Kikuo,Mukai Takashi

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference17 articles.

1. Measurement of valence-band offsets of InAlN/GaN heterostructures grown by metal–organic vapor phase epitaxy;Akazawa;J Appl Phys,2011

2. High temperature electron transport properties in AlGaN/GaN heterostructures;Tokuda;J Appl Phys,2011

3. Efficiency measurement of GaN-based quantum well and light-emitting diode structures grown on silicon substrates;Zhu;J Appl Phys,2011

4. Analysis of GaN etching damage by capacitively coupled RF Ar plasma exposure;Kawakami;Thin Solid Films,2008

5. Synergy effect of particle radiation and ultraviolet radiation from capacitively coupled radio frequency argon plasmas on n-GaN etching damage;Kawakami;Jpn J Appl Phys,2008

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Incremental effects of near-atmospheric-pressure low-temperature air plasma jet irradiation on polyphenol content in harvested onions;Journal of Physics D: Applied Physics;2024-08-29

2. Fluid modeling on effects of discharge parameters on ionization in capacitive radio frequency argon discharges at low pressure;Vacuum;2021-10

3. Damage Study of Irradiated Tungsten using fast focus mode of a 2.2 kJ plasma focus;Vacuum;2017-10

4. Characteristics of N2and O2Plasma-Induced Damages on AlGaN Thin Film Surfaces;physica status solidi (a);2017-09-05

5. Damage Characteristics of n-GaN Crystal Etched with N₂Plasma by Soft X-Ray Absorption Spectroscopy;e-Journal of Surface Science and Nanotechnology;2016

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3