Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference20 articles.
1. Investigation of Ta film growth mechanisms and atomic structures on polymer and SiC amorphous substrates
2. Thermal oxidation of tantalum films at various oxidation states from 300 to 700°C
3. The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films
4. Tantalum films for protective coatings of steel
Cited by 35 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Boosting photoelectrochemical water splitting with recyclable isotropic pyrolytic graphite conductive substrates;Science China Materials;2023-11-14
2. Friction and wear behaviors of Ta-based nanocrystalline composite coating under extreme sliding conditions;Surface and Coatings Technology;2023-07
3. Formation of tantalum coatings with a given structure on the surface of niti alloy by magnetron sputter deposition;Functional Composites and Structures;2022-11-30
4. Structure of tantalum coatings on NiTi substrate deposited by magnetron sputtering;Journal of Physics: Conference Series;2022-01-01
5. Formation and properties of ZrO2–Cu composite nanoglass films;Vacuum;2020-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3