A study on the interface and bulk charge density of AlN films with sputtering pressure
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference22 articles.
1. SAW characteristics of AlN films sputtered on silicon substrates
2. Integrated approach to electrode and AlN depositions for bulk acoustic wave (BAW) devices
3. Piezoelectric thin AlN films for bulk acoustic wave (BAW) resonators
4. Polycrystalline AlN films deposited at low temperature for selective UV detectors
5. Electrical properties of AlN thin films deposited at low temperature on Si(100)
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3. Optimal Growth Conditions for Forming c-Axis (002) Aluminum Nitride Thin Films as a Buffer Layer for Hexagonal Gallium Nitride Thin Films Produced with In Situ Continual Radio Frequency Sputtering;Micromachines;2022-09-17
4. Preparation of AlN thin film and the impacts of AlN buffer layer on the carrier transport properties of p-NiO/n-InN heterojunction by magnetron sputtering;Materials Science in Semiconductor Processing;2022-04
5. Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD;Surfaces and Interfaces;2021-12
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