Reduction of moisture and airborne molecular contamination on the purge system of 450 mm Front Opening Unified Pod-Reference-Cited by-同舟云学术

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Reduction of moisture and airborne molecular contamination on the purge system of 450 mm Front Opening Unified Pod

Published:2016-05 Issue: Volume:127 Page:10-16
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Chiu Bill,Hu Shih-Cheng,Shiue Angus,Huang Je-Yu

Funder

Gudeng Precision Industrial Com. Ltd.

Bureau of South and Central Taiwan Science Park

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference46 articles.

1. Organic Airborne Molecular Contamination in Semiconductor Fabrication Clean Rooms

2. Deposition and electrostatic removal of gaseous organic contaminants on substrate surfaces

3. Contamination Monitoring and Analysis in Semiconductor Manufacturing. Altis Semiconductor France;Baltzinger,2010

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Elimination of Si-C Defect on Wafer Surface in High-Temperature SPM Process Through Nitrogen Purge in 300-mm Single-Wafer Chamber;IEEE Transactions on Semiconductor Manufacturing;2024-08

2. A Numerical Study on the Effects of Purge and Air Curtain Flow Rates on Humidity Invasion Into a Front Opening Unified Pod (FOUP);IEEE Transactions on Semiconductor Manufacturing;2022-11

3. A comparative study of a front opening unified pod (FOUP) moisture removal efficiency with different purging gases;International Journal of Thermofluids;2022-11

4. Flow analysis of a front opening unified pod (FOUP) subjected to different fan filter unit (FFU) coverage area in mini-environment;International Journal of Thermofluids;2021-11

5. Review—Airborne Molecular Contamination: Recent Developments in the Understanding and Minimization for Advanced Semiconductor Device Manufacturing;ECS Journal of Solid State Science and Technology;2020-07-03

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