Effects of the surface oxide layer on platelet growth in H2+-implanted Si
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference25 articles.
1. Application of hydrogen ion beams to Silicon On Insulator material technology
2. On the mechanism of the hydrogen-induced exfoliation of silicon
3. Investigation of the cut location in hydrogen implantation induced silicon surface layer exfoliation
4. Hydrogen blistering of silicon: Progress in fundamental understanding
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Study of surface exfoliation on 6H-SiC induced by H2+ implantation;Physica B: Condensed Matter;2017-03
2. Study of surface blistering in GaN by hydrogen implantation at elevated temperatures;Thin Solid Films;2015-09
3. Molecular dynamics study on splitting of hydrogen-implanted silicon in Smart-Cut® technology;Journal of Semiconductors;2015-03
4. Effect of implantation temperature on exfoliation of H2+-implanted Si;Vacuum;2014-11
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