The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference23 articles.
1. Influence of high power densities on the composition of pulsed magnetron plasmas
2. Sputtered deposition;Westwood,2003
3. A novel pulsed magnetron sputter technique utilizing very high target power densities
4. Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
5. Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
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