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A comparative study on the properties of chromium coatings deposited by magnetron sputtering with hot and cooled target

  • Published:2017-09 Issue: Volume:143 Page:479-485
  • ISSN:0042-207X
  • Container-title:Vacuum
  • language:en
  • Short-container-title:Vacuum

Author:

Sidelev D.V.,Bleykher G.A.,Bestetti M.,Krivobokov V.P.,Vicenzo A.,Franz S.,Brunella M.F.

Funder

Russian Science Foundation

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference21 articles.

1. Pulsed magnetron sputtering of metallic films using a hot target;Vlcek,2009

2. Hot target sputtering: a new way for high-rate deposition of stoichiometric ceramic films;Mercs;Surf. Coat. Technol.,2006

3. Deposition of Zr-ZrOX and Y-YXOY films by reactive magnetron sputtering;Laurkaitis;Vacuum,2005

4. High-rate magnetron sputtering with hot target;Sidelev;Surf. Coat. Technol.,2016

5. Evaporation factor in productivity increase of hot target magnetron sputtering systems;Bleykher;Vacuum,2016

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