Refraction properties of PECVD of silicon nitride film-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Refraction properties of PECVD of silicon nitride film

Published:2004-01 Issue:4 Volume:72 Page:385-392
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Kim Byungwhan,Kim Dong Won,Han Seung Soo

Funder

Korea Science and Engineering Foundation

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference20 articles.

1. Effect of ions and radicals on formation of silicon nitride gate dielectric films using plasma chemical vapor deposition

2. Microstructure and interfacial states of silicon dioxide film grown by low temperature remote plasma enhanced chemical vapor deposition

3. Preparation of a ‐ SiN x Thin Film with Low Hydrogen Content by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

4. Low-temperature silicon nitride for thin-film electronics on polyimide foil substrates

5. A novel and effective PECVD SiO/sub 2//SiN antireflection coating for Si solar cells

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Machine Learning (ML)‐Assisted Design and Fabrication for Solar Cells;ENERGY & ENVIRONMENTAL MATERIALS;2019-09-17

2. Gas molecule dissociation effect on rf discharge burning in low pressure ammonia;Physics Letters A;2012-07

3. Experimental study of the effect of process parameters on plasma-enhanced chemical vapour deposition of silicon nitride film;Vacuum;2011-11

4. Plasma diagnostics and device properties of AlGaN/GaN HEMT passivated with SiN deposited by plasma-enhanced chemical vapour deposition;Journal of Physics D: Applied Physics;2010-11-23

5. Use of neural network to model a carrier life time of silicon nitride films deposited by using PECVD;Journal of the Korean Physical Society;2009-11-14

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3