Experimental study of the effect of process parameters on plasma-enhanced chemical vapour deposition of silicon nitride film

Author:

El Amrani A.,Bekhtari A.,Mahmoudi B.,Lefgoum A.,Menari H.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference31 articles.

1. Low stress PECVD—SiNx layers at high deposition rates using high power and high frequency for MEMS applications;Iliescu;Journal of Micromechanics and Microengineering,2006

2. Refractive index properties of SiN thin films and fabrication of SiN optical waveguide;Kim;Journal of Electroceramics,2006

3. Silicon nitride membrane for cell culturing;Iliescu;Romanian Journal of Information Science and Technology,2008

4. Photovoltaic properties of Si3N4 layer on silicon solar cell using silvaco software;Lennie;European Journal of Scientific Research,2009

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