Investigation into patterning of a stack-type Ru electrode capacitor-Reference-Cited by-同舟云学术

Investigation into patterning of a stack-type Ru electrode capacitor

Published:2003-08 Issue:1 Volume:69 Page:89-96
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Kim Hyoun Woo,Kang Chang-Jin

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. S. Yamamichi, P.-Y. Lesaicherre, H. Yamaguchi, K. Takemura, S. Sone, H. Yabuta, K. Sato, T. Tamura, K. Nakajima, S. Ohnishi, K. Tokashiki, Y. Hayashi, Y. Kato, Y. Miyasaka, M. Yoshida, H. Ono, IEDM 1995 Tech. Digest (1995) 119.

2. A. Yuuki, M. Yamamuka, T. Makita, T. Horikawa, T. Shibano, N. Hirano, H. Maeda, N. Mikami, K. Ono, H. Ogata, H. Abe, IEDM 1995 Tech. Digest (1995) 115.

3. B.T. Lee, K.H. Lee, C.S. Hwang, W.D. Kim, H. Horii, H.-W. Kim, H.-J. Cho, C.S. Kang, J.H. Chung, S.I. Lee, M.Y. Lee, IEDM Tech. Digest (1997) 249.

4. Ultrathin Ta2 O 5 Film Capacitor with Ru Bottom Electrode

5. Control of Etch Slope during Etching of Pt inAr/Cl2/O2Plasmas

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