Oxidation dependent crystallization behaviour of IO and ITO thin films deposited by reactive thermal deposition technique
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference17 articles.
1. Preparation of In2O3 and tin-doped In2O3 films by a novel activated reactive evaporation technique
2. Indium oxide Schottky junctions with InP and GaAs
3. Micrograin structure influence on electrical characteristics of sputtered indium tin oxide films
4. Electrical properties of vacuum-deposited indium oxide and indium tin oxide films
5. Electrical properties of undoped In2O3films prepared by reactive evaporation
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2. Effect of power density on compositional and structural evolution of ITO thin film by HiPIMS method;Vacuum;2022-06
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4. Effect of substrate feature on surface morphologies and properties of ITO films deposited by RF magnetron sputtering;Journal of Physics: Conference Series;2019-09-01
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