Sputter epitaxy and characterization of manganese-doped indium tin oxide films with different crystallographic orientations

Abstract

Epitaxial Mn-doped indium tin oxide (ITO) films were deposited on single-crystal yttria stabilized zirconia (YSZ) substrates with (111), (110), and (100) crystal plane orientations using RF magnetron sputtering. The epitaxial relationship between the Mn-doped ITO films and the YSZ substrates was studied using x-ray diffraction (XRD) patterns in the ω–2θ scan mode and XRD pole figures. The Mn-doped ITO films on the YSZ(111) and YSZ(110) substrates exhibited a higher degree of crystallinity than the film on the YSZ(100) substrate as per the x-ray rocking curves. Fluctuations in the crystalline alignment were found to significantly influence the electrical properties of Mn-doped ITO films. Ferromagnetic hysteresis loops were observed at room temperature for all the epitaxial Mn-doped ITO films, irrespective of their crystallographic orientation. The magnetic properties of the epitaxial Mn-doped ITO films suggest that a combination of delocalized charge carrier-mediated interaction and bound magnetic polaron-driven interaction is required to explain the origin of ferromagnetism in these films. The Mn-doped ITO film on the YSZ(111) substrate exhibited the most desirable characteristics in terms of crystallinity, surface smoothness, electrical conductivity, and magnetic properties.